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Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications (Volume 23) (Thin Films, Volume 23)
Francombe, Maurice H., Vossen, John L.
/ Academic Press 1997
311 pp., Hardcover, ex library, else text and binding clean and tight. Volumes
Included: 1
ISBN: 0125330235
Subject/Keywords: cj3 physics engineering
Item #: 1278234
$6.48